Basic parameters | |
Models |
HTC-613D |
Dimension (mm) |
L6300*D1450*H1560 |
Weight |
APPROX:3100KG |
Number of heating zones |
Top 6/ bottom 6 |
Number of cooling zones |
Top 3/ bottom 3 |
Cooling method |
Forced ice cooling |
Exhaust requirements |
10m3 /H*2 |
Void rate |
APPROX:1%-2% |
Control system | |
Power requirements |
3P 380V 50/60Hz |
Total power |
64KW |
Segmented starting power |
35KW |
Power consumption |
APPROX:13KW-18KW |
Hot air blower speed regulation |
Inverter stepless speed regulation |
Heating time |
APPROX:30min |
Temperature control range |
Room temperature ~ 400 °C can be set |
Production recipes |
Multi-combination production recipes can be stored |
Transportation | |
Number of lanes |
Single lane |
Rail structure |
3-segment combined structure |
Pallet dimension(mm) |
L330*D330 |
Conveyor height(mm) |
900±20 |
Mode of conveying |
Isometric board-pushing |
Vacuum system | |
Minimum vacuum pressure |
0.1Kpa |
Vacuum pump flow |
APPROX:1000L/min |
Pressure relief time |
≤10s |
Production efficiency |
≥40 s |
Optional nitrogen system | |
Nitrogen structure |
Full/partial nitrogen filling |
Nitrogen system |
Automatic |
Nitrogen consumption |
APPROX:300-500L/min |
HTC-613D Semiconductor Vacuum Oven-3 Cooling Zones
The air transport adopts microcirculation, and the temperature difference inside the zones is smaller.
The equidistant PCB-push structure is adopted, and there is no sensor inside the hood to limit the product distance, which can realize soldering under high-temperature.
SKU: HTC-613D
Categories: Semiconductor Series, Vacuum Reflow Oven
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